Serial Number:
76391052
Mark:
NANOOCS
Status:
Abandoned-No Statement of Use filed
Status Date:
08-12-2003
Filing Date:
Registration Number:
N/A
Registration Date:
N/A
Overlay optical metrology systems comprised of measurement optics, wafer handling mechanisms and system control hardware and software for measuring the difference between two nearly coincident patterns on a sample, such as a semiconductor wafer, which patterns are formed by a process such as photolithography, and which patterns are overlaid, one on top of the other and the overlay difference or error may be fed back to the exposure system that created the patterns so that this difference may be corrected on future exposures
Mark Description:
N/A
Class:
Scientific
Type of Mark:
Trademark
Published for Opposition Date:
11-19-2002
Owner:
Mark Drawing Status:
Typed Drawing
Abandon Date:
08-12-2003
Business Name:
N/A
Correspondent Name:
