MEDALD
By: ULTRATECH, INC.
associated with 34 other trademarks
atomic layer deposition systems comprised of a reaction chamber, precursor lines and a cabinet, all sold as a unit for performing atomic deposition la...

Words that describe this trademark:

atomic layer deposition  thin film deposition  semiconductor wafer processing  processing machines  deposition systems  film deposition  wafer processing  machines  including  systems 

Serial Number:

86868787

Mark:

MEDALD

Status:

Abandoned-No Statement of Use filed

Status Date:

01-15-2018

Filing Date:

Registration Number:

N/A

Registration Date:

N/A

Goods and Services:

atomic layer deposition systems comprised of a reaction chamber, precursor lines and a cabinet, all sold as a unit for performing atomic deposition layering for use in applying atomic layer coatings on various surfaces or for use as combined with a semiconductor wafer processing machine as a dual purpose unit

Mark Description:

N/A

Class:

Machines and machine tools

Type of Mark:

Trademark

Published for Opposition Date:

04-18-2017

Owner:

Mark Drawing Status:

Standart Character Mark

Abandon Date:

01-15-2018

Business Name:

ROYSE LAW FIRM, PC

Correspondent Name:

Recent Trademark filings by this company