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Showing 1-7 of 7 results
Mark Name
Mark Description
VANGUARD
Owned by:
ONTO INNOVATION...
Filed on: 03-18-1997
Status:
Cancelled-Section 8
apparatus for film thickness measurement, namely, ellipsometers, spectroscopic ellipsometers, reflectometers, spectroscopic reflectometers, pico
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METAPULSE
Owned by:
ONTO INNOVATION...
Filed on: 03-17-2022
Status:
Registered
Instruments for the measurement of thicknesses and mechanical properties of metal and opaque films
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METAPULSE
Owned by:
ONTO INNOVATION...
Filed on: 02-25-1997
Status:
Renewed
instruments for the measurement of thicknesses and adhesion properties of metal and opaque films
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SONUS
Owned by:
ONTO INNOVATION...
Filed on: 08-20-2013
Status:
Section 8 and 15-accepted...
INSTRUMENTS FOR THE MEASUREMENT OF THICKNESSES, DIMENSIONS AND ADHESION PROPERTIES OF METAL AND OPAQUE FILMS USED IN SEMICONDUCTOR MANUFACTURING
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UNIFIRE
Owned by:
ONTO INNOVATION...
Filed on: 02-17-2011
Status:
Cancelled-Section 8
Metrology system for inspection and measurement of semiconductor wafers and similar substrates in various stages of processing comprised of an i
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SPECTRALASER
Owned by:
ONTO INNOVATION...
Filed on: 03-18-1997
Status:
Cancelled-Section 8
ellipsometer based apparatus for transparent film thickness measurement for use in the semiconductor, disk drive, magnetic data storage, optical
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TRAJECTORY
Owned by:
ONTO INNOVATION...
Filed on: 02-17-2011
Status:
Renewed
Optical metrology apparatus for measurement of semiconductor wafers; optical metrology apparatus for integration with other process equipment fo
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