CLEAN W
associated with 825 other trademarks
Semiconductor wafer processing machines and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reac...

Words that describe this trademark:

chemical vapor deposition  semiconductor wafer processing  machines components  vapor deposition  wafer processing  processing machines  components  deposition  epitaxial  reactors 

Serial Number:

76481968

Mark:

CLEAN W

Status:

Cancelled-Section 8

Status Date:

10-19-2012

Filing Date:

Registration Number:

3068618

Registration Date:

03-14-2006

Goods and Services:

Semiconductor wafer processing machines and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon chips and silicon wafers

Mark Description:

N/A

Class:

Machines and machine tools

Type of Mark:

Trademark

Published for Opposition Date:

03-16-2004

Mark Drawing Status:

Typed Drawing

Abandon Date:

N/A

Business Name:

M/S 2061

Correspondent Name:

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