C P-LOK
associated with 59 other trademarks
Chemicals for use in the manufacture of low dielectric insulating film for use in semiconductors and integrated circuits; chemicals in the nature of p...

Words that describe this trademark:

chemicals manufacture  low dielectric  integrated circuits  dielectric insulating  insulating film  chemicals  manufacture  circuits  film  semiconductors 

Serial Number:

77192004

Mark:

C P-LOK

Status:

Abandoned-No Statement of Use filed

Status Date:

03-16-2009

Filing Date:

Registration Number:

N/A

Registration Date:

N/A

Goods and Services:

Chemicals for use in the manufacture of low dielectric insulating film for use in semiconductors and integrated circuits; chemicals in the nature of porogens, namely, decomposing chemicals for forming pores in low dielectric insulating film; post chemical mechanical planarization (CMP) cleaning chemical preparations for removing slurries and polishing debris

Mark Description:

N/A

Class:

Chemicals

Type of Mark:

Trademark

Published for Opposition Date:

11-20-2007

Mark Drawing Status:

Standart Character Mark

Abandon Date:

03-16-2009

Business Name:

AIR PRODUCTS AND CHEMICALS, INC.

Correspondent Name:

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